Machine Learning-Based Modelling in Atomic Layer Deposition Processes

Machine Learning-Based Modelling in Atomic Layer Deposition Processes portes grátis

Machine Learning-Based Modelling in Atomic Layer Deposition Processes

Karimzadeh, Sina; Jen, Tien-Chien; Adeleke, Oluwatobi

Taylor & Francis Ltd

12/2023

354

Dura

Inglês

9781032386706

15 a 20 dias

Descrição não disponível.
Part 1: Introduction to Atomic Layer Deposition. 1. Overview of Atomic Layer Deposition and Thin Film Technology. 2. State of the Art Modeling and Simulation Approaches in ALD. 3. Characterization Methods in ALD. 4. Industry 4.0, Manufacturing Sector and Thin Film Technology. Part 2: Machine Learning Techniques. 5. Fundamentals of Machine Learning. 6. Supervised Learning. 7. Unsupervised Learning. 8. Deep Learning. 9. Hard and Soft Computing. Part 3: Machine Learning Applications in Atomic Layer Deposition. 10. Why Machine Learning? 11. Machine-Learning Based Predictive Analysis in ALD. 12. Machine Learning-Based Classification Techniques in ALD. 13. Deep Learning in Atomic Layer Deposition. 14. Feature Engineering in Atomic Layer Deposition. 15. Limitations, Opportunities, and Future Directions.
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process optimization;predictive analytics;supervised learning;unsupervised algorithms;deep neural networks;process quality control;machine learning for thin film synthesis